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0539267 - ÚFCH JH 2022 RIV DE eng J - Journal Article
Krýsová, Hana - Neumann-Spallart, M. - Tarábková, Hana - Janda, Pavel - Kavan, Ladislav - Krýsa, J.
Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties.
Beilstein Journal of Nanotechnology. Roč. 12, JAN 2021 (2021), s. 24-34. ISSN 2190-4286. E-ISSN 2190-4286
R&D Projects: GA ČR(CZ) GA20-11635S; GA MŠMT(CZ) LM2018124
Institutional support: RVO:61388955
Keywords : Al2O3 * atomic layer deposition * corrosion
OECD category: Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)
Impact factor: 3.272, year: 2021
Method of publishing: Open access
Permanent Link: http://hdl.handle.net/11104/0316945