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0535135 - ÚACH 2021 US eng A - Abstract
Cheung, K. - Goronzy, D. P. - Stemer, D. - Zhao, CH. - Young, T. - Belling, J. - Baše, Tomáš - Andrews, A. - Weiss, P.
Advances in chemical lift-off lithography.
Abstracts of papers - American Chemical Society. Roč. 258, AUG (2019), č. článku 277-ANYL. ISSN 0065-7727.
[ACS Fall National Meeting and Exposition. 25.08.2019-29.08.2019, San Diego]
Institutional support: RVO:61388980
Keywords : lift-off lithography
OECD category: Inorganic and nuclear chemistry
Permanent Link: http://hdl.handle.net/11104/0313227