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0531792 - FZÚ 2021 RIV CH eng J - Journal Article
Hubička, Zdeněk - Zlámal, M. - Olejníček, Jiří - Tvarog, Drahoslav - Čada, Martin - Krýsa, J.
Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system.
Coatings. Roč. 10, č. 3 (2020), s. 1-14, č. článku 232. E-ISSN 2079-6412
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA17-20008S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : photocathode film * r-HiPIMS plus ECWR plasma * r-HiPIMS plasma * copper iron oxide * photocurrent
OECD category: Materials engineering
Impact factor: 2.881, year: 2020
Method of publishing: Open access
Permanent Link: http://hdl.handle.net/11104/0310408