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0524998 - FZÚ 2021 RIV CH eng J - Journal Article
Olejníček, Jiří - Šmíd, Jiří - Čada, Martin - Kšírová, Petra - Kohout, Michal - Perekrestov, Roman - Tvarog, D. - Kment, Štěpán - Kmentová, H. - Hubička, Zdeněk
High rate deposition of photoactive TiO₂ films by hot hollow cathode.
Surface and Coatings Technology. Roč. 383, Feb (2020), s. 1-10, č. článku 125256. ISSN 0257-8972
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MŠMT EF16_013/0001406; GA ČR GA17-20008S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; OP VVV - SAFMAT(XE) CZ.02.1.01/0.0/0.0/16_013/0001406
Institutional support: RVO:68378271
Keywords : TiO₂ * hollow cathode discharge * sputtering * thermal evaporation * deposition rate
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4.158, year: 2020
Method of publishing: Limited access
https://doi.org/10.1016/j.surfcoat.2019.125256
Permanent Link: http://hdl.handle.net/11104/0309201