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0497873 - FZÚ 2019 RIV US eng J - Journal Article
Makhotkin, I.A. - Milov, I. - Chalupský, Jaromír - Tiedtke, K. - Enkisch, H. - de Vries, G. - Scholze, F. - Siewert, F. - Sturm, J.M. - Nikolaev, K. - van de Kruijs, R.W.E. - Smithers, M.A. - van Wolferen, H.A.G.M. - Keim, E.G. - Louis, E. - Jacyna, I. - Jurek, M. - Klinger, D. - Pelka, J. B. - Juha, Libor - Hájková, Věra - Vozda, Vojtěch - Burian, Tomáš - Saksl, Karel - Faatz, B. - Keitel, B. - Ploenjes, E. - Schreiber, S. - Toleikis, S. - Loch, R. - Hermann, M. - Strobel, S. - Donker, R. - Mey, T. - Sobierajski, R.
Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold.
Journal of the Optical Society of America. B. Roč. 35, č. 11 (2018), s. 2799-2805. ISSN 0740-3224. E-ISSN 1520-8540
R&D Projects: GA ČR(CZ) GA17-05167s; GA MŠMT LG15013; GA ČR(CZ) GA14-29772S
Institutional support: RVO:68378271
Keywords : interaction of femtosecond XUV pulses * single-shot ablation threshold * damage accumulation in thin ruthenium films
OECD category: Optics (including laser optics and quantum optics)
Impact factor: 2.284, year: 2018
Permanent Link: http://hdl.handle.net/11104/0290344