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0489160 - ÚJF 2019 RIV CH eng J - Journal Article
Šímová, V. - Vlček, J. - Zuzjaková, Š. - Houška, J. - Shen, Y. - Jiang, J. C. - Meletis, E. I. - Peřina, Vratislav
Magnetron sputtered Hf-B-Si-C-N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance.
Thin Solid Films. Roč. 653, č. 5 (2018), s. 333-340. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA MŠMT LM2015056
Institutional support: RVO:61389005
Keywords : Hf-B-Si-C-N films * pulsed reactive magnetron sputtering * electrical conductivitiy * optical transparency * high-temperature oxidation resistance
OECD category: Nuclear physics
Impact factor: 1.888, year: 2018
Permanent Link: http://hdl.handle.net/11104/0283663