Basket

0486984 - FZÚ 2018 RIV US eng J - Journal Article
Straňák, V. - Kratochvíl, J. - Olejníček, Jiří - Kšírová, Petra - Sezemsky, P. - Čada, Martin - Hubička, Zdeněk
Enhanced oxidation of TiO₂ films prepared by high power impulse magnetron sputtering running in metallic mode.
Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-9, č. článku 171914. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA ČR(CZ) GA15-00863S
Institutional support: RVO:68378271
Keywords : sputter deposition * plasma deposition * gas discharges * metallic thin films * probe plasma diagnostics
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.176, year: 2017
Permanent Link: http://hdl.handle.net/11104/0281690