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0477782 - ÚPT 2018 RIV NL eng J - Journal Article
Krátký, Stanislav - Kolařík, Vladimír - Horáček, Miroslav - Meluzín, Petr - Král, Stanislav
Combined e-beam lithography using different energies.
Microelectronic Engineering. Roč. 177, JUN (2017), s. 30-34. ISSN 0167-9317. E-ISSN 1873-5568
R&D Projects: GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : grayscale e-beam lithography * mix and match process * absorbed energy density * resist sensitivity * micro-optical elements
OECD category: Nano-processes (applications on nano-scale)
Impact factor: 2.020, year: 2017
Permanent Link: http://hdl.handle.net/11104/0274006