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0470666 - FZÚ 2017 RIV US eng J - Journal Article
Lundin, D. - Čada, Martin - Hubička, Zdeněk
Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 34, č. 4 (2016), 1-10, č. článku 041305. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA ČR(CZ) GA15-00863S
EU Projects: European Commission(XE) 608800 - HIPPOCAMP
Institutional support: RVO:68378271
Keywords : radiofrequency current * voltage measurements * energy-distributions * sheath voltages * deposition * density * hysteresis * discharges * films * technology
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 1.374, year: 2016
Permanent Link: http://hdl.handle.net/11104/0268241