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  1. 1.
    0464298 - FZU-D 2017 RIV DE eng A - Abstract
    Hubička, Zdeněk - Čada, Martin - Kment, Štěpán - Olejníček, Jiří
    FeS2 thin films deposition by reactive high power magnetron sputtering in Ar+H2S gas mixture.
    International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. Braunschweig: European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016. s. 137-137.
    [International Conference on Plasma Surface Engineering ( PSE 2016 ). 12.09.2016-16.09.2016, Garmisch-Partenkirchen]
    R&D Projects: GA TA ČR TA03010743
    Institutional support: RVO:68378271
    Keywords : sputtering * HIPIMS * films * semiconductor * deposition
    Subject RIV: BL - Plasma and Gas Discharge Physics
    Permanent Link: http://hdl.handle.net/11104/0268994