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0464298 - FZÚ 2017 RIV DE eng A - Abstract
Hubička, Zdeněk - Čada, Martin - Kment, Štěpán - Olejníček, Jiří
FeS₂ thin films deposition by reactive high power magnetron sputtering in Ar+H₂S gas mixture.
International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. Braunschweig: European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016. s. 137-137.
[International Conference on Plasma Surface Engineering ( PSE 2016 ). 12.09.2016-16.09.2016, Garmisch-Partenkirchen]
R&D Projects: GA TA ČR TA03010743
Institutional support: RVO:68378271
Keywords : sputtering * HIPIMS * films * semiconductor * deposition
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0268994