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0451587 - ÚPT 2016 RIV US eng J - Journal Article
Krátký, Stanislav - Urbánek, Michal - Kolařík, Vladimír
PEC Reliability in 3D E-beam DOE Nanopatterning.
Microscopy and Microanalysis. Roč. 21, S4 (2015), s. 230-235. ISSN 1431-9276. E-ISSN 1435-8115
R&D Projects: GA MŠMT(CZ) LO1212
Institutional support: RVO:68081731
Keywords : proximity effect correction * diffractive optical elements
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.730, year: 2015
Permanent Link: http://hdl.handle.net/11104/0252722