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0449004 - FZÚ 2016 RIV DE eng J - Journal Article
Pokorný, Petr - Musil, Jindřich - Fitl, Přemysl - Novotný, Michal - Lančok, Ján - Bulíř, Jiří
Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber.
Plasma Processes and Polymers. Roč. 12, č. 5 (2015), s. 416-421. ISSN 1612-8850. E-ISSN 1612-8869
R&D Projects: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/1312; GA ČR(CZ) GAP108/11/0958; GA ČR(CZ) GA14-10279S
Institutional support: RVO:68378271
Keywords : contamination * low-pressure discharges * magnetron * metallic films * sputtering
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 2.713, year: 2015
Permanent Link: http://hdl.handle.net/11104/0250593