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    1.
    0437396 - ÚPT 2015 RIV CZ cze V - Research Report
    Jákl, Petr
    SMV-2014-09: Řešení nanolitografického systému založeného na dvoufotonové fotopolymerizaci.
    [SMV-2014-09: Nanolithography system based on two-photon photopolymerization.]
    Brno: Měřící technika Morava, s.r.o, 2014. 2 s.
    Source of funding: N - Non-public resources
    Keywords : two-photon photopolymerization * nanolitography * optical litography * holography
    Subject RIV: BH - Optics, Masers, Lasers
    Permanent Link: http://hdl.handle.net/11104/0240986
     
     

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