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0429792 - ÚPT 2019 RIV CZ eng C - Conference Paper (international conference)
Urbánek, Michal - Kolařík, Vladimír - Krátký, Stanislav - Matějka, Milan - Horáček, Miroslav - Chlumská, Jana
Monte-Carlo simulation of proximity effect in e-beam lithography.
NANOCON 2013. 5th International Conference Proceedings. Ostrava: TANGER Ltd, 2013, s. 723-726. ISBN 978-80-87294-44-4.
[NANOCON 2013. International Conference /5./. Brno (CZ), 16.10.2013-18.10.2013]
R&D Projects: GA MŠMT ED0017/01/01; GA MŠMT EE.2.3.20.0103; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : Monte–Carlo * proximity effect simulation * e–beam lithography
OECD category: Optics (including laser optics and quantum optics)
Permanent Link: http://hdl.handle.net/11104/0234836