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0422122 - FZÚ 2015 RIV CH eng J - Journal Article
Olejníček, Jiří - Hubička, Zdeněk - Kment, Štěpán - Čada, Martin - Kšírová, Petra - Adámek, Petr - Gregora, Ivan
Investigation of reactive HiPIMS + MF sputtering of TiO₂ crystalline thin films.
Surface and Coatings Technology. Roč. 232, OCT (2013), s. 376-383. ISSN 0257-8972
R&D Projects: GA MŠMT LH12045; GA ČR GAP108/12/1941; GA MŠMT LD12002; GA ČR GAP108/12/2104; GA MŠMT LH12043
Institutional support: RVO:68378271
Keywords : HiPIMS * mid-frequency * ion velocity distribution function * TiO₂ * rutile
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 2.199, year: 2013
http://www.sciencedirect.com/science/article/pii/S0257897213004829
Permanent Link: http://hdl.handle.net/11104/0228323