0390982 - ÚPT 2013 RIV CZ eng C - Conference Paper (international conference)
Matějka, Milan - Urbánek, M. - Kolařík, V. - Horáček, M. - Krátký, Stanislav - Mikšík, P. - Vašina, J.Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures.
NANOCON 2012, 4th International Conference Proceedings. Ostrava: TANGER Ltd, 2012, s. 729-732. ISBN 978-80-87294-32-1.
[NANOCON 2012. International Conference /4./. Brno (CZ), 23.10.2012-25.10.2012]
R&D Projects: GA MPO FR-TI1/576; GA MŠMT ED0017/01/01; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : 3D resist structures * variable shape electron beam lithography * proximity effect simulation and correction * polymer resist * development process simulation
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0219947
