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0368401 - ÚJF 2012 eng A - Abstract
Muresan, M. - Zajíčková, L. - Pekařík, V. - Buršíková, V. - Ondráček, P. - Campbellová, A. - Peřina, Vratislav - Mikšová, Romana
Optimized Plasma Enhanced Chemical Vapor Deposition from HMDSO/O2 for Surface Protection of Metals.
[Optimized Plasma Enhanced Chemical Vapor Deposition from HMDSO/O2 for Surface Protection of Metals.]
2011.
[NANOCON 2011. International Conference /3./. 21.09.2011-23.09.2011, Brno]
Institutional research plan: CEZ:AV0Z10190503
Keywords : SiO2 * Aluminium * Steel * PECVD
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0202756