0367516 - ÚPT 2012 RIV US eng C - Conference Paper (international conference)
Hrabina, Jan - Lazar, Josef - Klapetek, P. - Číp, OndřejAFM nanometrology interferometric system with the compensation of angle errors.
Optical Measurement Systems for Industrial Inspection VII (Proceedings of SPIE Vol. 8082). Bellingham: SPIE, 2011, 80823U:1-6. ISBN 978-0-8194-8678-3.
[Optical Measurement Systems for Industrial Inspection VII. Munich (DE), 23.05.2011-26.05.2011]
R&D Projects: GA MŠMT(CZ) LC06007; GA MŠMT 2C06012; GA MPO 2A-1TP1/127; GA MPO FT-TA3/133; GA MPO 2A-3TP1/113; GA ČR GA102/09/1276; GA ČR GA102/07/1179
Institutional research plan: CEZ:AV0Z20650511
Keywords : atomic force microscopy (AFM) * nanometrology * nanoscale * nanopositioning * interferometry * abbe errors
Subject RIV: BH - Optics, Masers, Lasers
Permanent Link: http://hdl.handle.net/11104/0202169
