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0358498 - ÚMCH 2012 RIV DE eng J - Journal Article
Kochalska, Anna - Nožár, Juraj - Nešpůrek, Stanislav - Peter, Jakub
Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances.
Macromolecular Symposia. Roč. 295, č. 1 (2010), s. 71-76. ISSN 1022-1360.
[Prague Meetings on Macromolecules /73./ New Frontiers in Macromolecular Science: From Macromolecular Concepts of Living Matter to Polymers for Better Quality of Life. Prague, 05.07.2009-09.07.2009]
R&D Projects: GA AV ČR KAN400720701; GA AV ČR IAA100100622; GA MŠMT OC 138
Institutional research plan: CEZ:AV0Z40500505
Keywords : lithography * photodegradation * polymer
Subject RIV: BM - Solid Matter Physics ; Magnetism
Permanent Link: http://hdl.handle.net/11104/0196523