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0350671 - ÚPT 2011 RIV CZ eng C - Conference Paper (international conference)
Urbánek, Michal - Kolařík, Vladimír - Král, Stanislav - Dvořáková, Marie
Determination of proximity effect forward scattering range parameter in e-beam lithography.
Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Brno: Institute of Scientific Instruments AS CR, v.v.i, 2010 - (Mika, F.), s. 67-68. ISBN 978-80-254-6842-5.
[International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /12./. Skalský dvůr (CZ), 31.05.2010-04.06.2010]
R&D Projects: GA MPO FR-TI1/576; GA MŠMT ED0017/01/01
Institutional research plan: CEZ:AV0Z20650511
Keywords : electron beam lithography * proximity effect
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
http://arl-repository.lib.cas.cz/uloziste_av/UPT-D/cav_un_epca-0350671_01.pdf
Permanent Link: http://hdl.handle.net/11104/0190611