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0334316 - FZÚ 2010 RIV GB eng J - Journal Article
Čada, Martin - Virostko, Petr - Kment, Štěpán - Hubička, Zdeněk
Measurement of total energy flux density at a substrate during TiO_x thin film deposition by using a plasma jet system.
Vacuum. Roč. 83, č. 4 (2009), s. 738-744. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA AV ČR KJB100100707; GA AV ČR KAN301370701
Institutional research plan: CEZ:AV0Z10100522
Keywords : hollow cathode * plasma jet * sputtering * pulsed DC * energy influx on substrate * TiO₂
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 0.975, year: 2009
http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW4-4SJ2WRT-2&_user=625012&_rdoc=1&_fmt=&_orig=search&_sort=d&view=c&_acct=C000031722&_vers
Permanent Link: http://hdl.handle.net/11104/0179088