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0032069 - ÚJF 2006 RIV DE eng J - Journal Article
Supiot, P. - Vivien, C. - Macková, Anna - Granier, A. - Escaich, D. - Bousquet, A. - Clergereaux, R. - Raynaud, P. - Strýhal, Z. - Pavlík, J.
Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors.
[Růst a modifikace organosilikonových vrstev v plasmatických reaktorech.]
Plasma Processes and Polymers. Roč. 3, č. 2 (2006), s. 100-109. ISSN 1612-8850. E-ISSN 1612-8869
R&D Projects: GA MŠMT OC 527.100; GA MŠMT 1P05OC014
Institutional research plan: CEZ:AV0Z90610521
Keywords : FT-IR * organosilicon precursors * plasma polymerisation
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 2.298, year: 2006
Permanent Link: http://hdl.handle.net/11104/0132676