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0585696 - ÚFCH JH 2025 RIV NL eng J - Journal Article
Krýsová, Hana - Cichoň, S. - Kapran, A. - Volfová, L. - Chvostová, D. - Imrich, T. - Neumann-Spallart, M. - Krýsa, J. - Hubička, Z.
Deposition of Fe2O3:Sn semiconducting thin films by reactive pulsed HiPIMS + ECWR co-sputtering from Fe and Sn targets.
Journal of Photochemistry and Photobiology A-Chemistry. Roč. 454, SEP 2024 (2024), č. článku 115676. ISSN 1010-6030. E-ISSN 1873-2666
R&D Projects: GA ČR(CZ) GA23-05266S; GA MŠMT(CZ) LM2023066; GA MŠMT(CZ) EF16_013/0001821
Research Infrastructure: CzechNanoLab - 90110
Institutional support: RVO:61388955
Keywords : HiPIMS * ECWR * Co-sputtering
OECD category: Physical chemistry
Impact factor: 4.3, year: 2022
Method of publishing: Limited access
https://www.sciencedirect.com/science/article/pii/S101060302400220X?via%3Dihub
Permanent Link: https://hdl.handle.net/11104/0353396