Basket

0574800 - ÚPT 2024 RIV US eng J - Journal Article
Čech, V. - Bránecký, Martin
Synthesis of thin-film materials using nonthermal plasma at a higher degree of dissociation.
Plasma Processes and Polymers. Roč. 20, č. 7 (2023), č. článku 2300019. ISSN 1612-8850. E-ISSN 1612-8869
Institutional support: RVO:68081731
Keywords : degree of dissociation * nonthermal plasma * organosilicon precursors * plasma-enhanced chemical vapor deposition (PECVD) * sticking coefficient * thin films
OECD category: Polymer science
Impact factor: 3.5, year: 2022
Method of publishing: Limited access
https://onlinelibrary.wiley.com/doi/10.1002/ppap.202300019
Permanent Link: https://hdl.handle.net/11104/0344768