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0538597 - ÚFP 2021 RIV US eng C - Conference Paper (international conference)
Frolov, Oleksandr - Koláček, Karel - Schmidt, Jiří - Štraus, Jaroslav - Choukourov, A.
Nanostructuring of PMMA, GaAs, SiC and Si samples by focused XUV laser beam.
Optics Damage and Materials Processing by EUV/X-ray Radiation VII. Bellingham: SPIE, 2019 - (Juha, L.; Bajt, S.; Guizard, S.), Roč. 11035 (2019), č. článku 110350K. Proceedings of SPIE, 11035. ISBN 978-151062736-9. ISSN 0277-786X.
[Conference on Optics Damage and Materials Processing by EUV/X-Ray Radiation VII. Praha (CZ), 01.04.2019-03.04.2019]
R&D Projects: GA MŠMT LTT17015
Institutional support: RVO:61389021
Keywords : Ablation * Diffraction pattern * Nanopatterning * Nanostructuring * XUV laser
OECD category: Optics (including laser optics and quantum optics)
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11035/110350K/Nanostructuring-of-PMMA-GaAs-SiC-and-Si-samples-by-focused/10.1117/12.2521444.short?SSO=1
Permanent Link: http://hdl.handle.net/11104/0316374