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0538153 - ÚFE 2021 RIV GB eng J - Journal Article
Vasin, A.V. - Rusaysky, A. V. - Bortchagovsky, E. G. - Gomeniuk, Y.V. - Nikolenko, A.S. - Strelchuk, V.V. - Yatskiv, Roman - Tiagulskyi, Stanislav - Prucnal, S. - Skorupa, W. - Nazarov, A.N.
Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputtering.
Vacuum. Roč. 174, April (2020), č. článku 109199. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA ČR GA19-02804S
Institutional support: RVO:67985882
Keywords : Doping effects of methane * Powder target * RF magnetron sputtering * ZnO thin films
OECD category: Nuclear physics
Impact factor: 3.627, year: 2020
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2020.109199
Permanent Link: http://hdl.handle.net/11104/0315975