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0534005 - ÚJF 2021 RIV GB eng J - Journal Article
Torrisi, Alfio - Horák, Pavel - Vacík, Jiří - Cannavó, Antonino - Ceccio, Giovanni - Vaniš, Jan - Yatskiv, Roman - Grym, Jan
Multilayered Cu-Ti deposition on silicon substrates for chemiresistor applications.
Phosphorus, Sulfur and Silicon and the Related Elements. Roč. 195, č. 11 (2020), s. 932-935. ISSN 1042-6507. E-ISSN 1563-5325
R&D Projects: GA MŠMT LM2015056; GA ČR GA19-02804S
Institutional support: RVO:61389005 ; RVO:67985882
Keywords : chemiresistor * Cu-Ti * intermixing layers * SIMS analysis * thermal annealing
OECD category: Inorganic and nuclear chemistry; Electrical and electronic engineering (URE-Y)
Impact factor: 1.082, year: 2020
Method of publishing: Limited access
https://doi.org/10.1080/10426507.2020.1804166
Permanent Link: http://hdl.handle.net/11104/0312228