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0517208 - ÚPT 2020 RIV CZ cze V - Research Report
Krátký, Stanislav - Matějka, Milan - Chlumská, Jana - Horáček, Miroslav - Kolařík, Vladimír - Meluzín, Petr - Král, Stanislav
SMV-2019-03: Tenké membrány.
[SMV-2019-03: Thin membranes.]
Brno: FEI Czech Republic, 2019. 5 s.
Source of funding: N - Non-public resources
Keywords : e-beam lithography * wet etching * plasma etching * reactive ion etching
OECD category: Nano-processes (applications on nano-scale)
Permanent Link: http://hdl.handle.net/11104/0302493