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0486979 - FZÚ 2018 RIV US eng J - Journal Article
Hippler, R. - Hubička, Zdeněk - Čada, Martin - Kšírová, Petra - Wulff, H. - Helm, C.A. - Straňák, V.
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO₂ layers.
Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-9, č. článku 171906. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA ČR(CZ) GA15-00863S
Institutional support: RVO:68378271
Keywords : HiPIMS * Langmuir probe * titanium dioxide * angular dependence * XRD * SEM
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.176, year: 2017
Permanent Link: http://hdl.handle.net/11104/0281685