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0463044 - ÚCHP 2017 RIV CH eng J - Journal Article
Jandová, Věra - Pokorná, Dana - Kupčík, Jaroslav - Dytrych, Pavel - Cuřínová, Petra - Fajgar, Radek - Pola, Josef
Infrared Laser Radiation-Produced TiO-doped Si/SiOx/SiO2 Nanocomposite – Entry to TiO-containing Materials.
Journal of Photochemistry and Photobiology A-Chemistry. Roč. 332, JAN 1 (2017), s. 376-383. ISSN 1010-6030. E-ISSN 1873-2666
R&D Projects: GA TA ČR TA04010169
Institutional support: RVO:67985858 ; RVO:61388980
Keywords : thin film deposition * IR laser ablation * red-shifted UV–vis spectrum
OECD category: Physical chemistry; Inorganic and nuclear chemistry (UACH-T)
Impact factor: 2.891, year: 2017
Permanent Link: http://hdl.handle.net/11104/0265236