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1.

0543772 - ÚT 2022 RIV US eng C - Conference Paper (international conference)
Prokopová, Olga - Blahut, Aleš - Čenský, Miroslav - Součková, Monika - Vinš, Václav
Water & air calibration of vibrating-tube densimeter at temperatures from 0 to 90 °C and atmospheric pressure.
21st Symposium on Thermophysical Properties. Boulder, Colorado, 2021, č. článku 4054..
[Symposium on Thermophysical Properties /21./. Boulder, Colorado (US), 20.06.2021-25.06.2021]
R&D Projects: GA ČR(CZ) GA19-05696S
Institutional support: RVO:61388998
Keywords : fluid density * uncertainty * vibrating tube densimeter * water
OECD category: Thermodynamics
https://thermosymposium.org/
Permanent Link: http://hdl.handle.net/11104/0321124

2.

0362886 - PSÚ 2012 RIV CZ cze J - Journal Article
Filip, Miroslav
Schizofrenie z hlediska psychologie osobních konstruktů: teorie, výzkum, psychoterapie.
[Schizophrenia from the point of view of psychology of personal constructs: theory, research, psychotherapy.]
Československá psychologie. Roč. 55, č. 3 (2011), 204-221. ISSN 0009-062X. E-ISSN 1804-6436
R&D Projects: GA ČR GP406/09/P604
Institutional research plan: CEZ:AV0Z70250504
Keywords : schizophrenia * personal construct psychology * psychotherapy
Subject RIV: AN - Psychology
Impact factor: 0.087, year: 2011
Permanent Link: http://hdl.handle.net/11104/0199062

	File	Download	Size	Commentary	Version	Access
	filip1.pdf	4	458.5 KB		Publisher’s postprint	require

3.

0449277 - ÚPT 2016 RIV CZ cze C - Conference Paper (international conference)
Krátký, Stanislav - Meluzín, Petr - Urbánek, Michal - Matějka, Milan - Chlumská, Jana - Horáček, Miroslav - Kolařík, Vladimír
Amplitudově fázová vortexová maska.
[An Amplitude-Phase Vortex Photo Mask.]
Sborník příspěvků multioborové konference LASER 55. Brno: Ústav přístrojové techniky AV ČR, 2015, s. 32-33. ISBN 978-80-87441-16-9.
[LASER 55. Třešť (CZ), 21.10.2015-23.10.2015]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : photo mask * vortex beam * e-beam lithography
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0251045