Basket

    1.
    0336864 - ÚPT 2010 RIV CZ cze J - Journal Article
    Matějka, František
    Elektronová litografie.
    [E-Beam Lithography.]
    Zpravodaj ČVS. Roč. 16, č. 1 (2008), s. 25-34. ISSN 1213-2705
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : e-beam lithography * resist proceses
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Permanent Link: http://hdl.handle.net/11104/0181000
     
     

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.

Accept allSettingsReject all