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0185751 - UJF-V 20033067 RIV CH eng J - Journal Article
Benedikt, J. - Woen, RV. - van Mensfoort, SLM. - Peřina, Vratislav - Hong, J. - van de Sanden, MCM.
Plasma chemistry during the deposition of a-C : H films and its influence on film properties.
Diamond and Related Materials. Roč. 12, č. 2 (2003), s. 90-97. ISSN 0925-9635. E-ISSN 1879-0062
R&D Projects: GA AV ČR KSK4055109; GA ČR GA104/03/0385
Institutional research plan: CEZ:AV0Z1048901
Keywords : plasma chemistry * spectroscopic ellipsometry
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 1.867, year: 2003
Permanent Link: http://hdl.handle.net/11104/0082128