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0134270 - FZU-D 20030166 RIV NL eng J - Journal Article
Mišina, Martin
Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films.
Surface and Coatings Technology. 169-170, - (2003), s. 53-56. ISSN 0257-8972.
[Frontiers of Surface Engineering. Nagoya, 28.10.2001-31.10.2001]
R&D Projects: GA MŠMT ME 455; GA ČR GA106/99/D086
Institutional research plan: CEZ:AV0Z1010914
Keywords : magnetron * reactive sputtering * titanium carbide * metan * argon
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.410, year: 2003
Permanent Link: http://hdl.handle.net/11104/0032184