0523925 - ÚJF 2021 RIV GB eng J - Článek v odborném periodiku
Torrisi, L. - Havránek, Vladimír - Torrisi, Alfio - Cutroneo, Mariapompea - Silipigni, L.Laser and ion beams graphene oxide reduction for microelectronic devices.
Radiation Effects and Defects in Solids. Roč. 175, 3-4 (2020), s. 226-240. ISSN 1042-0150
Grant CEP: GA MŠk LM2015056; GA MŠk EF16_013/0001812; GA ČR GA19-02482S
Institucionální podpora: RVO:61389005
Klíčová slova: Graphene oxide * ion beam reduction * lithography * laser * ion beam * electronic device
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 0.642, rok: 2019
https://doi.org/10.1080/10420150.2019.1701456
Trvalý link:
http://hdl.handle.net/11104/0308215
