Košík

0464298 - FZÚ 2017 RIV DE eng A - Abstrakt
Hubička, Zdeněk - Čada, Martin - Kment, Štěpán - Olejníček, Jiří
FeS₂ thin films deposition by reactive high power magnetron sputtering in Ar+H₂S gas mixture.
International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. Braunschweig: European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016. s. 137-137.
[International Conference on Plasma Surface Engineering ( PSE 2016 ). 12.09.2016-16.09.2016, Garmisch-Partenkirchen]
Grant CEP: GA TA ČR TA03010743
Institucionální podpora: RVO:68378271
Klíčová slova: sputtering * HIPIMS * films * semiconductor * deposition
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Trvalý link: http://hdl.handle.net/11104/0268994