from the conferences organized by TANGER Ltd.
In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100–800 °C.
Keywords: Ti/Ni, multilayers, magnetron sputtering, nanoindentation, annealing© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.