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Effect of pulsed laser annealing on optical and structural properties of ZnO:Eu thin film

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Abstract

ZnO:Eu thin film fabricated by pulsed laser deposition was treated by pulsed UV laser. The effect of laser fluence from 70 to 125 mJ cm−2 on film properties was investigated. The results showed that the surface morphology was clearly modified and the film treated at laser fluence of 70 mJ cm−2 was more densified compared to the other annealed films. Laser treatment led to a reduction of carbon content and to a stoichiometric ZnO:Eu composition on the surface. Refractive index significantly decreased and extinction coefficient was blue shifted for higher laser fluences. Strong characteristic Eu3+ transitions were obtained using excitation at 266 nm. The highest photoluminescence intensity was observed for the annealed film at a laser fluence of 70 mJ cm−2. The influence of ambient composition (N2 and O2) and temperature (room temperature and 150 °C) to photoluminescence response was examined for optical gas sensor application. The laser-untreated film showed higher sensitivity to the presence of oxygen at both temperatures compared to the treated film. The stability of photoluminescence intensity at elevated temperature was improved for laser-treated areas.

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Acknowledgements

The research was supported by the Czech Science Foundation (Project GA18-17834S), Czech Ministry of Education, Youth and Sports (SOLID21—CZ.02.1.01/0.0/0.0/16_019/0000760), and by institutional research funding (IUT34-27) of the Estonian Ministry of Education and Research. International collaboration was supported by a bilateral project between Academies of Sciences—Czech and Estonian (EST-18-01).

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Authors and Affiliations

  1. Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 182 21, Prague, Czech Republic

    Š. Havlová, M. Novotný, P. Fitl, J. More-Chevalier, J. Remsa, P. Hruška, J. Bulíř, L. Fekete, L. Volfová, M. Vondráček & J. Lančok

  2. Department of Physics and Measurements, University of Chemistry and Technology Prague, Technická 5, 166 28, Prague, Czech Republic

    Š. Havlová, P. Fitl & M. Vrňata

  3. Institute of Physics, University of Tartu, W. Ostwaldi 1, 504 11, Tartu, Estonia

    V. Kiisk, M. Kodu & R. Jaaniso

  4. Institute of Plasma Physics of the Czech Academy of Sciences, Za Slovankou 1782/3, 182 00, Prague, Czech Republic

    F. Lukáč

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Havlová, Š., Novotný, M., Fitl, P. et al. Effect of pulsed laser annealing on optical and structural properties of ZnO:Eu thin film. J Mater Sci 56, 11414–11425 (2021). https://doi.org/10.1007/s10853-021-06030-w

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