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In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3

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Abstract

The control and arguably the tailoring aspect of technologies like pulsed laser deposition (PLD) rises from understanding the chemistry hidden by the laser generated plasma. With the continuous transition towards thin films with complex structures and geometries, the comprehension of the fundamental processes during the film deposition becomes critical. During the PLD of Mo and Eu-doped Lu2O3, optical emission spectroscopy was implemented for in-situ plasma monitoring. The spatial distribution of individual elements revealed the structuring of a stoichiometric plasma while the formation of LuO molecule within the plasma plume is seen as being induced by the addition of a minimum 1 Pa of O2. The energy of the ejected particles was controlled through doping and O2 pressure. The effect of O2 pressure over the plasma energy revealed a transition from an atomic dominated region towards a molecular dominated one. The properties of the resulted films were analyzed by XRD, AFM, and photoluminescence techniques and show a strong correlation between the dynamical regime of the plasma and their structural properties.

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Acknowledgements

This work was supported by Czech Science Foundation, project 18-17834S, by Romanian Ministry of Education and Research, under Romanian National Nucleu Program LAPLAS VI – contract n.16N/2019, ELI-RO_2020_12 and Postdoctoral Project PD 145 ⁄ 2020. We acknowledge the Operational Program Research, Development and Education financed by European Structural and Investment Funds and the Czech Ministry of Education, Youth and Sports SOLID21 CZ.02.1.01/0.0/0.0/16_019/0000760.

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Authors and Affiliations

  1. National Institute for Laser, Plasma and Radiation Physics – NILPRP, 409 Atomistilor Street, Bucharest, Romania

    S. Irimiciuc

  2. Institute of Physics of the Czech Academy of Sciences, Na Slovance 2, Prague, Czech Republic

    S. Irimiciuc, J. More-Chevalier, S. Chertpalov, L. Fekete, M. Novotný, Š. Havlová, M. Poupon, T. Zikmund, K. Kůsová & J. Lančok

  3. University of Chemistry and Technology, Technicka 5, Prague, Czech Republic

    Š. Havlová

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  1. S. Irimiciuc
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  2. J. More-Chevalier
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  3. S. Chertpalov
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  4. L. Fekete
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  5. M. Novotný
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  6. Š. Havlová
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  9. K. Kůsová
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  10. J. Lančok
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Contributions

Conceptualization: SI, MN; methodology: SI, MN, JM-C, JL; formal analysis and investigation: JM-C, SC, LF, ŠH, MP, TZ, KK; writing – original draft preparation: SI, MN, JM-C, JL; writing – review and editing: SC, KK, JL, MN; Resources: JL, MN; supervision: JL, MN.

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Correspondence to S. Irimiciuc.

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Irimiciuc, S., More-Chevalier, J., Chertpalov, S. et al. In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3. Appl. Phys. B 127, 140 (2021). https://doi.org/10.1007/s00340-021-07689-4

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  • DOI: https://doi.org/10.1007/s00340-021-07689-4

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