The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor
Robert J. Wandell1, Stefan Bresch2, Huihui Wang1, Vaclav Babicky2, Petre Lukes2, Bruce R. Locke1, *
* The author to whom correspondence should be addressed.
1 Department of Chemical and Biomedical Engineering, FAMU-FSU College of Engineering, Florida State University, Tallahassee FL, United States
2 Institute of Plasma Physics of the Czech Academy of Sciences, Pulse Plasma Systems Department, Prague 8, Czech Republic
Abstract
The influence of pulse frequency (1-60 kHz) in a nanosecond filamentary discharge propagating along a flowing liquid water film was assessed with regards to the formation of chemical species with argon and helium carrier gasses. The production rate and energy yield for H2O2 and H2 were measured for both carrier gases, and O2 formation was determined for helium. The effect of pulse frequency on the energy dissipated per pulse as well as electron density was also investigated. The results indicate that the energy yield for H2O2 decreases with increasing pulse frequency while the energy yields of H2 and O2 remain relatively unaffected. It is proposed that the difference in the trends of the liquid versus gas phase products can be attributed to the significantly longer residence time of the liquid phase allowing for more degradation of formed hydrogen peroxide before it is able exit the reactor.
Keywords - Non-thermal plasma, nanosecond discharge, hydrogen peroxide, pulse frequency, filamentary discharge, wet plasma.
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