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Comparison Between Chemical and Plasmatic Treatment of Seeding Layer for Patterned Diamond Growth

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Abstract

We employ UV photolithographic and electron beam lithographic patterning of diamond seeding layer on SiO2/Si substrates for the selective growth of micrometer and sub-micrometer diamond patterns. Using bottom-up strategy, thin diamond channels (470 nm in width) are directly grown. Differences between wet chemical and plasma treatment on the patterned diamond growth are studied. We find that the density of parasitic diamond crystals (outside predefined patterns) is lowered for gas mixture CF4/O2 plasma than for rich O2 plasma. After CF4/O2 plasma treatment, the density of parasitic crystals is 106 cm-2 which is comparable to the wet chemical treatment. Introducing sandwich-like structure, i.e. photoresist-seeding layer-photoresist, and its treatment (lift-off and CF4/O2 plasma) further reduces the density of parasitic crystals down to 105 cm-2. The advantage of this novel treatment is short processing time, simplicity, and minimal damage of the substrate surface.

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References

  1. Y. Fu, H. Du, J. Miao, Jour. Mat. Proc. Technol. 132, 73 (2003).

    Article  CAS  Google Scholar 

  2. A. Bongrain, E. Scorsone, L. Rousseau, G. Lissorgues, C. Gesset, S. Saada and P. Bergonzo, J. Micromech. Microeng., 19, 074015 (2009).

    Article  Google Scholar 

  3. G.F. Ding, H.P. Mao, Y.L. Cai, Y.H. Zhang, X. Yao, X.L. Zhao: Diam. Relat. Mater. 14, 1543 (2005)

    Article  CAS  Google Scholar 

  4. M.P. Hiscocks, C.J. Kaalund, F. Ladouceur, S.T. Huntington, B.C. Gibson, S. Trpkovski, D. Simpson, E. Ampem-Lassen, S. Prawer, J.E. Butler: Diam. Relat. Mater., 17, 1831 (2008).

    Article  CAS  Google Scholar 

  5. Y. S. Zou, Y. Yang, W. J. Zhang, Y. M. Chong, B. He, I. Bello, S. T. Lee, App. Phys. Lett. 92, 053105 (2008).

    Article  Google Scholar 

  6. H. Gamo, K. Shimada, M. Nishitani-Gamo, T. Ando: Jpn. J. Appl. Phys. 46, 6267 (2007).

    Article  CAS  Google Scholar 

  7. N.A. Fox, M.J. Youh, J.W. Steeds, W.N. Wang, J. Appl. Phys. 87, 8187 (2000).

    Article  CAS  Google Scholar 

  8. Y.-H. Chen, C.-T. Hu, I-N. Lin: Jap. Jour. Appl. Phys 36, 6900 (1997).

    Article  CAS  Google Scholar 

  9. Y. Sakamoto, M. Takaya, H. Sugimura, O. Takai, N. Nakagiri: Thin Solid Films, 334, 161 (1998).

    Article  CAS  Google Scholar 

  10. A. Massod, M. Aslam, M.A. Tamor, T.J. Potter, J. Electrochem. Soc. 138, L67 (1991).

    Article  Google Scholar 

  11. M.W. Geis, J.C. Twichell, T.M. Lyszczarz, J. Vac. Sci. Technol. B14 2060 (1996).

    Article  Google Scholar 

  12. K. Hirabayashi, Y. Taniguchi, O. Takamatsu, T. Ikeda, K. Ikoma and N. Iwasaki-Kurihara: Appl. Phys. Lett. 53, 1815 (1988).

    Article  CAS  Google Scholar 

  13. H. Liu, C. Wang, C. Gao, Y. Han, J. Luo, G. Zou and C. Wen: J. Phys.: Condens. Matter, 14, 10973 (2002).

    CAS  Google Scholar 

  14. O. A. Williams, O. Douhéret, M. Daenen, K. Haenen, E. Osawa, M. Takahashi, Chem. Phys. Lett. 445, 255 (2007).

    Article  CAS  Google Scholar 

  15. A. Kromka, B. Rezek, Z. Remes, M. Michalka, M. Ledinsky, J. Zemek, J. Potmesil, M. Vanecek, Chemical Vapor Deposition 14, 181 (2008).

    Article  CAS  Google Scholar 

  16. A. Kriele, O.A. Williams, M. Wolfer, D. Brink, W. Muller-Sbert, C. E. Nebel, Appl. Phys. Let. 95, 031905 (2009).

    Article  Google Scholar 

  17. A. Kromka, O. Babchenko, B. Rezek, M. Ledinsky, K. Hruska, J. Potmesil, M. Vanecek, Thin Solid Films 518, 343 (2009).

    Article  CAS  Google Scholar 

  18. A. Kromka, O. Babchenko, H. Kozak, K. Hruska, B. Rezek, M. Ledinsky, J. Potmesil, M. Michalka, M. Vanecek: Diam. Relat. Mater. 18, 734 (2009).

    Article  CAS  Google Scholar 

  19. A. Kromka, O. Babchenko, H. Kozak, B. Rezek and M. Vanecek, phys. stat. sol. b 246 2654 (2009).

    Article  CAS  Google Scholar 

  20. H. Kozak et al, accepted for publication in Sensor Letters (2009).

  21. Y. Ando, Y. Nishibayashi, K. Kobashia, T. Hirao, K. Oura: Diam. Relat. Mater. 11, 824 (2002).

    Article  CAS  Google Scholar 

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Authors and Affiliations

  1. Institute of Physics AS CR, v.v.i., Cukrovarnicka 10, Praha 6, CZ-16253, Czech Republic

    A. Kromka, O. Babchenko, B. Rezek, K. Hruska, A. Purkrt & Z. Remes

  2. Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University in Prague, Trojanova 13, Praha 2, CZ-12000, Czech Republic

    O. Babchenko & A. Purkrt

Authors
  1. A. Kromka
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  2. O. Babchenko
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  3. B. Rezek
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  4. K. Hruska
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  5. A. Purkrt
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  6. Z. Remes
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Kromka, A., Babchenko, O., Rezek, B. et al. Comparison Between Chemical and Plasmatic Treatment of Seeding Layer for Patterned Diamond Growth. MRS Online Proceedings Library 1203, 1753 (2009). https://doi.org/10.1557/PROC-1203-J17-53

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  • DOI: https://doi.org/10.1557/PROC-1203-J17-53

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