Efficient materials processing by dual action of XUV/Vis-NIR ultrashort laser pulses

Krzysztof Jakubczak; Tomas Mocek; Jiri Polan; Pavel Homer; Bedrich Rus; I Jong Kim; Chul Min Kim; Seung Beom Park; Tae Keun Kim; Gye Hwang Lee; Chang Hee Nam; Jaromir Chalupsky; Vera Hájková; Libor Juha; Jaroslav Sobota; Tomas Forst

doi:10.1117/12.822433

18 May 2009 Efficient materials processing by dual action of XUV/Vis-NIR ultrashort laser pulses

Krzysztof Jakubczak, Tomas Mocek, Jiri Polan, Pavel Homer, Bedrich Rus, I Jong Kim, Chul Min Kim, Seung Beom Park, Tae Keun Kim, Gye Hwang Lee, Chang Hee Nam, Jaromir Chalupsky, Vera Hájková, Libor Juha, Jaroslav Sobota, Tomas Forst

Author Affiliations +

Proceedings Volume 7361, Damage to VUV, EUV, and X-Ray Optics II; 73610A (2009) https://doi.org/10.1117/12.822433
Event: SPIE Optics + Optoelectronics, 2009, Prague, Czech Republic

Abstract

We demonstrate a novel experimental method for efficient structural surface modification of various solids (PMMA, amorphous carbon) achieved by simultaneous action of XUV (21.6 nm), obtained from High-order Harmonic Generation (HHG), and Vis-NIR (410/820 nm) laser pulses. Although the fluence of each individual pulse was far below the surface ablation threshold, very efficient and specific material modification was observed after irradiation even by a single shot of mixed XUV/Vis-NIR radiation.

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Krzysztof Jakubczak, Tomas Mocek, Jiri Polan, Pavel Homer, Bedrich Rus, I Jong Kim, Chul Min Kim, Seung Beom Park, Tae Keun Kim, Gye Hwang Lee, Chang Hee Nam, Jaromir Chalupsky, Vera Hájková, Libor Juha, Jaroslav Sobota, and Tomas Forst "Efficient materials processing by dual action of XUV/Vis-NIR ultrashort laser pulses", Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 73610A (18 May 2009); https://doi.org/10.1117/12.822433

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