Abstract
Perfluorinated compounds (PFCs) increasingly utilized in electronic manufacturing represent a potent source of global warming effect. Because of extremely high stability of PFCs only very high temperature is effective for their destruction. Thermal plasma offers higher destruction and removal efficiency as compared to conventional methods allowing to reach sufficiently high temperature as well as suitable conditions, including high enthalpy and reactive environment for destruction even of the most persistent PFCs. The aim pursued by this work is to apply water and gas stabilized DC-plasma torch for generating steam plasma for efficient abatement of the most persistent PFC, i.e., CF4, and to observe a dependence of destruction and removal efficiency on operational conditions, including concentration of CF4, input arc power of the plasma torch and an influence of an additional gas. The experiments were carried out at 20 kW and 40 kW of torch power in the concentration range 1–20% of CF4 in mixture with both nitrogen and argon and total feed rate 50 L/min in plasma chemical reactor. The mixture with argon exhibit considerably higher destruction efficiency than that with nitrogen. The highest destruction efficiency was attained in the mixture CF4/argon at 40 kW of torch power. Among other gases (CO2, O2, H2) added to CF4 the only hydrogen exhibited a positive effect to destruction performance. It was found an optimal feed rate of additional hydrogen corresponding to the maximum of destruction efficiency.
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This work was supported by the Czech Science Foundation (GA CR) under Project No. GC17-10246 J.
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Živný, O., Hlína, M., Serov, A. et al. Abatement of Tetrafluormethane Using Thermal Steam Plasma. Plasma Chem Plasma Process 40, 309–323 (2020). https://doi.org/10.1007/s11090-019-10047-0
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DOI: https://doi.org/10.1007/s11090-019-10047-0