Study of Li diffusion in thin film of Re annealed at high temperatures

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Published 19 May 2020 © 2020 IOP Publishing Ltd and Sissa Medialab
, , Citation A. Cannavò et al 2020 JINST 15 P05010 DOI 10.1088/1748-0221/15/05/P05010

1748-0221/15/05/P05010

Abstract

Depth profiles of 6Li implanted into high-melting point rhenium refractory metal has been measured for as-implanted, as well as thermally annealed samples using a non-destructive Thermal Neutron Depth Profiling technique at the LWR-15 research reactor in Řež. The Gaussian-like shape, typical for as-implanted Li-depth profile, is preserved after the thermal annealing at high temperature demonstrating the activation of the Li atom diffusion process at the Re-target. The diffusion coefficient at 1830oC has been evaluated by the comparison of the Li profiles before and after the thermal annealing. This study aims to investigate the applicability of Re metal in ISOL related applications.

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10.1088/1748-0221/15/05/P05010