Počet záznamů: 1
Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold
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SYSNO ASEP 0489644 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold Tvůrce(i) Makhotkin, I.A. (NL)
Sobierajski, R. (PL)
Chalupský, J. (CZ)
Tiedtke, K. (DE)
de Vries, G. (NL)
Stoermer, M. (DE)
Scholze, F. (DE)
Siewert, F. (DE)
van de Kruijs, R.W.E. (NL)
Louis, E. (NL)
Jacyna, I. (PL)
Jurek, M. (PL)
Klinger, D. (PL)
Nittler, L. (PL)
Syryanyy, Y. (PL)
Juha, Libor (UFP-V) ORCID
Hájková, V. (CZ)
Vozda, V. (CZ)
Burian, Tomáš (UFP-V) ORCID
Saksl, K. (SK)
Faatz, B. (DE)
Keitel, B. (DE)
Ploenjes, E. (DE)
Schreiber, S. (DE)
Toleikis, S. (DE)
Loch, R. (DE)
Hermann, M. (DE)
Strobel, S. (DE)
Nienhuys, H.-K. (NL)
Gwalt, G. (DE)
Mey, T. (DE)
Enkisch, H. (DE)Zdroj.dok. Journal of Synchrotron Radiation. - : Oxford Blackwell - ISSN 0909-0495
Roč. 25, č. 1 (2018), s. 77-84Poč.str. 8 s. Forma vydání Online - E Akce Workshop on FEL Photon Diagnostics, Instrumentation and Beamline Design (PhotonDiag2017) Datum konání 01.05.2017 - 03.05.2017 Místo konání Stanford Země US - Spojené státy americké Typ akce WRD Jazyk dok. eng - angličtina Země vyd. DK - Dánsko Klíč. slova free-electron laser induced damage ; EUV optics ; thin films ; FELs Vědní obor RIV BL - Fyzika plazmatu a výboje v plynech Obor OECD Fluids and plasma physics (including surface physics) CEP GA14-29772S GA ČR - Grantová agentura ČR LG15013 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy Institucionální podpora UFP-V - RVO:61389021 UT WOS 000418593300013 EID SCOPUS 85038971075 DOI 10.1107/S1600577517017362 Anotace The durability of grazing-and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20 degrees and 10 degrees grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16 degrees off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface. Pracoviště Ústav fyziky plazmatu Kontakt Vladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975 Rok sběru 2019
Počet záznamů: 1