Počet záznamů: 1

Investigation of the negative ions in Ar/O.sub.2./sub. plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry

SYSNO ASEP	0363960
Druh ASEP	J - Článek v odborném periodiku
Zařazení RIV	J - Článek v odborném periodiku
Poddruh J	Článek ve WOS
Název	Investigation of the negative ions in Ar/O₂ plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry
Tvůrce(i)	Pokorný, Petr (FZU-D)_{RID, ORCID, SAI} Mišina, Martin (FZU-D) Bulíř, Jiří (FZU-D)_{RID, ORCID, SAI} Lančok, Ján (FZU-D)_{RID, ORCID} Fitl, Přemysl (FZU-D)_{RID, ORCID} Musil, Jindřich (FZU-D)_{RID, ORCID} Novotný, Michal (FZU-D)_{RID, ORCID, SAI}
Zdroj.dok.	Plasma Processes and Polymers. - : Wiley - ISSN 1612-8850 Roč. 8, č. 5 (2011), s. 459-464
Poč.str.	6 s.
Jazyk dok.	eng - angličtina
Země vyd.	DE - Německo
Klíč. slova	energy-resolved ion mass spectrometry ; formation of negative ions ; magnetron sputtering ; mass spectrometry ; transparent conductive oxide
Vědní obor RIV	BM - Fyzika pevných látek a magnetismus
CEP	IAA100100718 GA AV ČR - Akademie věd
	KAN400100653 GA AV ČR - Akademie věd
	GP202/09/P324 GA ČR - Grantová agentura ČR
CEZ	AV0Z10100522 - FZU-D (2005-2011)
UT WOS	000290633300011
DOI	10.1002/ppap.201000195
Anotace	The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow fO2 was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra.Main attention was devoted to the investigation of O , O 2 , AlO , AlO 2 , ZnO , ZnO 2 , and AlO 3 negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated.
Pracoviště	Fyzikální ústav
Kontakt	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Rok sběru	2012

Počet záznamů: 1