Počet záznamů: 1

Time-Resolved Fourier Transform Emission Spectroscopy of CF3Br and CF3CFHCF3 in a Pulsed Electrical Discharge

SYSNO ASEP	0359539
Druh ASEP	J - Článek v odborném periodiku
Zařazení RIV	J - Článek v odborném periodiku
Poddruh J	Článek ve WOS
Název	Time-Resolved Fourier Transform Emission Spectroscopy of CF3Br and CF3CFHCF3 in a Pulsed Electrical Discharge
Tvůrce(i)	Ferus, Martin (UFCH-W)_{ORCID, RID} Civiš, Svatopluk (UFCH-W)_{RID, ORCID, SAI} Kubelík, Petr (UFCH-W)_{RID, ORCID} Nevrlý, V. (CZ) Bitala, P. (CZ) Grigorová, E. (CZ) Střižík, M. (CZ) Kubát, Pavel (UFCH-W)_{RID, ORCID, SAI} Zelinger, Zdeněk (UFCH-W)_{RID, ORCID}
Zdroj.dok.	Plasma Chemistry and Plasma Processing. - : Springer - ISSN 0272-4324 Roč. 31, č. 3 (2011), s. 417-426
Poč.str.	10 s.
Jazyk dok.	eng - angličtina
Země vyd.	US - Spojené státy americké
Klíč. slova	helium discharge plasma ; CF3Br ; CF3CHFCF3
Vědní obor RIV	CF - Fyzikální chemie a teoretická chemie
CEP	IAA400400705 GA AV ČR - Akademie věd
	IAAX00100903 GA AV ČR - Akademie věd
	OC09050 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy
	GAP108/11/1312 GA ČR - Grantová agentura ČR
CEZ	AV0Z40400503 - UFCH-W (2005-2011)
UT WOS	000290225100002
DOI	10.1007/s11090-011-9296-1
Anotace	The environmentally important decomposition of halogenated species CF3Br and CF3CHFCF3 in helium discharge plasma was investigated by time-resolved high-resolution Fourier transform infrared emission spectroscopy. Contrary to classical pyrolysis, a deeper fragmentation of precursors up to atoms and lower molecular species was observed. Excited molecular products CF, CF2 and CF4 achieved the maximal concentration in the afterglow. The high concentration of all these species is in agreement with a kinetic model based on radical chemistry. The non-detectable concentration of CF3 can be connected to its high reactivity and the formation of more stable products, CF4 and CF2, by addition or release of a fluorine atom, respectively. Other products included HF, HBr, CO and cyano compounds that were produced by secondary reactions with traces of water vapor, atmospheric oxygen and nitrogen present in original industrial samples as impurities.
Pracoviště	Ústav fyzikální chemie J.Heyrovského
Kontakt	Michaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
Rok sběru	2012

Počet záznamů: 1