Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses

Mocek, Tomáš - Jakubczak, Krzysztof - Kozlová, Michaela - Polan, Jiří - Homer, Pavel - Hřebíček, J. - Sawicka, Magdalena - Kim, I. J. - Park, S.B. - Kim, C. M. - Lee, G.H. - Kim, T.K. - Nam, C. H. - Chalupský, Jaromír - Hájková, Věra - Juha, Libor - Sobota, Jaroslav - Fořt, Tomáš - Rus, Bedřich
Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses.
Radiation Effects and Defects in Solids. Roč. 165, 6-10 (2010), s. 551-558. ISSN 1042-0150. E-ISSN 1029-4953
Impakt faktor: 0.660, rok: 2010
http://hdl.handle.net/11104/0190317