Počet záznamů: 1
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
- 1.Hubička, Zdeněk - Zlámal, M. - Čada, Martin - Kment, Štěpán - Krysa, J.
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering.
Catalysis Today. Roč. 328, May (2019), s. 29-34. ISSN 0920-5861. E-ISSN 1873-4308
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 5.825, rok: 2019
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.cattod.2018.11.034
http://hdl.handle.net/11104/0302301
Počet záznamů: 1