Surface stoichiometry and depth profile of Ti.sub.x./sub.-Cu.sub.y./sub.N.sub.z./sub. thin films deposited by magnetron sputtering

0552187 - FZÚ 2022 RIV CH eng J - Článek v odborném periodiku
Mukhopadhyay, A.K. - Roy, A. - Bhattacharjee, G. - Das, S.C. - Majumdar, A. - Wulff, H. - Hippler, Rainer
Surface stoichiometry and depth profile of Ti_x-Cu_yN_z thin films deposited by magnetron sputtering.
Materials. Roč. 14, č. 12 (2021), č. článku 3191. E-ISSN 1996-1944
Institucionální podpora: RVO:68378271
Klíčová slova: magnetron sputtering * Ti-Cu-N coating * N incorporation * X-ray photoelectron spectroscopy * X-ray diffraction * transmission electron microscopy
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 3.748, rok: 2021
Způsob publikování: Open access
Trvalý link: http://hdl.handle.net/11104/0327392